Ideal for large O-ring sealed vacuum systems and load locks, the UVB-100 is designed to desorb water vapor and remove oxidative hydrocarbon in high and ultra-high vacuum chambers, the UVB-100 Water Desorption System utilizes UV radiation to desorb layers of water vapor without the intense heat of IR or a radiant bakeout.
For surface analysis systems, using a UVB-100 means that you can load samples more quickly and without introducing water vapor into your system. For high vacuum systems, faster pump-down times mean more process runs and higher productivity.
In production systems, the UVB-100 provides faster ultimate pressure and quicker removal of desorbed water during pumpdown.
For added safety when using the UVB-100, a handheld, the easy-to-use battery-powered UV-C Meter is available as an optional purchase.
For more information on water vapor and it's effects on vacuum chambers, please see this collection of articles (compiled by Normandale Community College) by the late Phil Danielson (formally of The Vacuum Lab).
Demo Units Available
Not sure if the UVB-100 will work for your application? Contact us for more information about our rental program. For a nominal rental charge, you can try a UVB-100 package for 30 days and see if you get the desired results. If so and you decide to purchase the package, then the rental fee is applied to the purchase price.
2.75 CF (top) or NW40 (K150) KF (bottom) - (other flange mounts are available on request)
Theory of Operation
Layers of water vapor molecules on the inside of vacuum chambers can be desorbed by energizing them with ultra-violet radiation in the range of 190 to 200nm, which provides sufficient energy to break covalent bonds. The graphs below show the effect of UV energy on water, hydrogen, oxygen and CO2. In this case, the UV emitter was activated for 8 minutes and then turned off. You can see from the graphs that the water vapor desorption rate increased during the UV ON time and then dropped off significantly when the UV was turned OFF.
The second graph shows an increase in H and a significant increase in CO2 as well as a reduction in oxygen during the UV ON time and a corresponding decrease in CO2 and H when the UV was turned OFF. The CO2 will vary with the amount of hydrocarbon available for reaction with O free radicals and O3.
For more information on the use of in-situ Ultraviolet Radiation to desorb water vapor we suggest the following:
Degassing a vacuum system with in-situ UV radiation.
(Journal of Vacuum Science & Technology A (Vol.30, Issue 6)
Water vapor in vacuum systems by A Berman
The National Physical Laboratory of Israel, Danciger Bldg. Hebrew University, Jerusalem 91904, Israel
The following application notes are modified versions of various editions of The Vacuum Chronicles, originally published by Phil Danielson - inventor of the Phototron, the design of which the UVB-100 is based.
- UVB-100: How It Works (pdf)
- UVB-100: Residual Gas Composition (pdf)
- UVB-100: UV Enhanced Deposition Part 1 (pdf)
- UVB-100: UV Enhanced Deposition Part 2 (pdf)
- UVB-100: Water Desorption Pressure Relationship (pdf)