1401 Ion Source and Controller
The Model 1401 Ion Source is ideal for use in surface chemistry experiments such as sample preparation and depth profiling with Auger and XPS. It can be used with most inert gasses.
With a beam current of 20 µA into a 0.4mm diameter spot at a working distance of 25 mm, the source can deliver 10 times
the current density of other commonly available ion sources. Select spot sizes down to 50 µm at a beam current of 1 µA from the
front panel. Beam energy is variable from 5 eV to 5 kV while maintaining best focus at the sample.
Beam current is adjustable independent of beam voltage over a wide range and is measurable from the front panel without external equipment.
1401 Specification Sheet
1401 SOLIDWORKS® File
1402 Low-Energy Ion Source and Controller
The Model 1402 Ion Source features high beam currents at very low beam energies.
It also may be operated at high beam energies (up to 3 keV) to provide additional depth profiling and sample cleaning capability.
Applications include charge compensation, ion scattering, and studies of ion/solid interactions.
Ion generation is by means of electron impact ionization with dual filaments for long source life without having to break system vacuum.
The filaments are located off axis to prevent line of sight deposition of the filament material onto the sample.
1402 Specification Sheet
1402 SOLIDWORKS® File
1407 High Sputter Rate Ion Source and Controller
The Model 1407 Ion Source features Duoplasmatron performance in an electron impact ionization ion source. By means of changeable apertures in the optics column,
a wide range of beam currents and spot sizes may be obtained. At a beam energy of 5 keV, beam current may be adjusted from 2 uA into a 20 um diameter spot to 20 µA into a 100 um diameter spot.
The optics column includes an integral Faraday cup for beam current measurement
1407 Specification Sheet