Physical Electronics Sputter Ion Gun Comparison Matrix

 

Sputter Ion Source Model 04-165
IG2
3 kV
Large Area
04-303 1401 1402 1407
Source Type Backfill
Electron Impact
Backfill
Electron Impact
Differentially Pumped Electron Impact Differentially Pumped Electron Impact Differentially Pumped Electron Impact Differentially Pumped Electron Impact
Max Beam Energy 2 keV 3 keV 5 keV 5 keV 3 keV 5 keV
Min. Beam Diameter 3.5 mm 10 mm 200 um 400 um 200 um 15 um
Max.Current Density 100 µA/cm2 20 µA/cm2 600 µA/cm2 50 A/cm2 5 uA max current @ 2 keV beam 20 uA max current @ 5 keV beam
Differentially Pumped No No, but direct injection Yes Yes Yes Yes
Raster No No, but can be focused to a 1 cm circle 1 cm x 1 cm 7 mm x 7 mm 7 mm x 7 mm 7 mm x 7 mm
Gas Species Ar, He, N, Ne, Kr, Xe & O Ar, He3, He4, Ne, O, N, Xe Ar, He3, He4, Ne, O, N, Xe Ar, He3, He4, Ne, O, N, Xe Ar, He3, He4, Ne, O, N, Xe Ar, He3, He4, Ne, O, N, Xe
CF Flange 2.75 in 2.75 i 2.75 in 2.75 in 2.75 in 4.5 in